Alt_Cph is an independent biennial gathering selected institutional partners, artists and contemporary artist-run and alternative exhibition spaces across Europe. Each biennial is curated by a new team and involves its audience in the pertinent questions of the present. Alt_Cph 20: Patterns in Resistance is curated by the Laboratory for Aesthetics and Ecology. In collaboration with a number of Danish, Nordic and International stakeholders Patterns in Resistance – in Danish, Mønstre I modstand – examines the intersections and nodes between the labor of the hand and a multiplicity of analogue and digital technologies.

 

Read the full curatorial manifesto here.

 

Patterns in Resistance includes co-curations by Ida Schyum and ARIEL – Feminisms in the Aesthetics.

The Laboratory for Aesthetics and Ecology is represented by Dea Antonsen, Ida Bencke and Miriam Wistreich.

Curatorial assistance by Laura Gerdes-Miranda and Stephanie Serrano Sundby.

Patterns in Resistance borrows its title from the 2015 artwork Self Machine (Pattern in Resistance) by visual artist Mette Clausen. Clausen’s  artistic practice has been a big inspiration for the project.

 

 

Alt_Cph is initiated by FABRIKKEN for Kunst og Design.

Among the previous curators are Anna & Esben Weile Kjær (2018), Råderum v. Charlotte Bagger Brandt (2016), Carl Martin Faurby (2015) and Anna Vallgårda & Henrik Menné (2014). Alt_Cph is established and hosted by Fonden FABRIKKEN for Kunst & Design.

 

 

Patterns in Resistance is realized with generous support from Det Obelske Familiefond, Københavns Kommune, Statens Kunstfond, Nordisk Kulturfond (Handmade), Knud Højgaards Fond.